Inductive Type Impedance of Mo/<i>n</i>-Si Barrier Structures Irradiated with Alpha Particles

Abstract

In silicon microelectronics, flat metal spirals are formed to create an integrated inductance. However, the maximum specific inductance of such spirals at low frequencies is limited to a value of the order of tens of microhenries per square centimeter. Gyrators, devices based on operational amplifiers with approximately the same specific inductance as spirals, are also used. Despite the fact that such solutions have been introduced into the production of integrated circuits, the task of searching for new elements with high values of specific inductance is relevant. An alternative to coils and gyrators can be the effect of negative differential capacitance (i.e., inductive type impedance), which is observed in barrier structures based on silicon.The purpose of the work is to study the low-frequency impedance of Schottky diodes (Mo/n-Si) containing defects induced by α-particles irradiation and determination of the parameters of these defects by methods of low-frequency impedance spectroscopy and DLTS (Deep Level Transient Spectroscopy).Unpackaged Schottky diodes Mo/n-Si (epitaxial layer of 5.5 μm thickness and resistivity of 1 Ohm∙cm) produced by JSC “Integral” are studied. Inductance measurements were carried out on the as manufactured diodes and on the diodes irradiated with alpha particles (the maximum kinetic energy of an αparticle is 5.147 MeV). The impedance of inductive type of the Schottky diodes at the corresponding DC forward current of 10 µA were measured in the AC frequency range from 20 Hz to 2 MHz. DLTS spectra were used to determine the parameters of radiation-induced defects. It is shown that irradiation of diodes with alpha particles produces three types of radiation-induced defects: A-centers with thermal activation energy of E1 ≈ 190 meV, divacancies with activation energies of E2 ≈ 230 meV and E3 ≈ 410 meV, and Ecenters with activation energy of E4 ≈ 440 meV measured relative to the bottom of c-band of silicon.