Process for Growth of Group-IV Alloys Containing Tin by Remote Plasma Enhanced Chemical Vapor Deposition
Author:
Funder
Air Force Office of Scientific Research
Publisher
Frontiers Media SA
Subject
Materials Science (miscellaneous)
Reference57 articles.
1. An optically pumped 2.5?μm GeSn laser on Si operating at 110?K.;Al-Kabi;Appl. Phys. Lett.,2016
2. Epitaxial growth of metastable SnGe alloys.;Asom;Appl. Phys. Lett.,1989
3. GeSn growth kinetics in reduced pressure chemical vapor deposition from Ge2H6 and SnCl4.;Aubin;J. Cryst. Growth,2018
4. Afterglow and decaying plasma CVD systems.;Bàrdoš;Vacuum,1988
5. Synthesis of ternary SiGeSn semiconductors on Si(100) via SnxGe1-x buffer layers.;Bauer;J, Appl. Phys. Lett.,2003
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