The effect of contact aspect ratio and film to substrate elastic modulus ratio on stress vs. strain up to the point of yield during flat punch thin film indentation of an elastic-plastic film

Author:

Sinnott Aaron D.,Brazil Owen,Cross Graham L. W.

Abstract

Nanoindentation is the only way to test the local mechanical properties of thin films and coatings. Current analysis treats the measurement as a perturbation of a conventional half-space indentation, typically limiting testing to films with modulus within an order of magnitude of the supporting substrate and contact dimension much smaller than the film thickness. In the layer compression test (LCT), a flat punch is aligned and indented into the film with a contact size much greater than the film thickness. This produces a novel test condition emulating uniform uniaxial strain even with significant penetration into the film beyond plastic yield. In this work, we perform a finite element analysis to assess the quality of this approximation in the confined elastic regime of deformation up to the point of yield via a parametric study of punch radius to film thickness ratio and film to substrate modulus ratio for a simple elastic-plastic material. Our simulations were performed with a low E/Y ratio of 10, which is typical of polymers, biomaterials and other amorphous systems. We find that for substrates of sufficiently high stiffness relative to the film sample, once a simple substrate stiffness correction is performed the layer compression test load vs. displacement slope estimates the film confined modulus to within a few percent with only minor variation throughout the entire pre-yield strain region for a wide range of aspect ratios. We also present experimental layer compression test findings for a supported polymer film conducted over a contact aspect ratio range of 9–22 and discuss the trends observed relative to the simulations.

Funder

Science Foundation Ireland

Publisher

Frontiers Media SA

Subject

Materials Science (miscellaneous)

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3