Ion Beam Assisted E-Beam Deposited TiN Microelectrodes—Applied to Neuronal Cell Culture Medium Evaluation
Author:
Funder
Tekes
Academy of Finland
Suomen Kulttuurirahasto
Publisher
Frontiers Media SA
Subject
General Neuroscience
Reference42 articles.
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3. Measurement of sealing resistance of cell-electrode interfaces in neuronal cultures using impedance spectroscopy;Buitenweg;Med. Biol. Eng. Comput.,1998
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5. The effect of surface chemistry and structure of titanium nitride (TiN) films on primary hippocampal cells;Cyster;Biomol. Eng.,2002
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