1. Necessity of chemical edge bead removal in modern day lithographic processing;Proceedings of the Advances in Resist Technology and Processing XXI,2004
2. Tadashi, H. (1994). Method of Detecting Position of Orientation Flat of Semiconductor Wafer. (06236918), JP Patent.
3. Berken, L.M. (1998). Wafer Positioning System. (5740062), U.S. Patent.
4. Freerks, F.W. (1999). Wafer Position Error Detection and Correction System. (5980194), U.S. Patent.
5. Yoo, W.S. (2003). Wafer Alignment System and Method. (6516244), U.S. Patent.