Simultaneous Measurement of Group Refractive Index Dispersion and Thickness of Fused Silica Using a Scanning White Light Interferometer

Author:

Lee Heesu1ORCID,Hwang Seungjin2,Kong Hong Jin34,Hong Kyung Hee4,Yu Tae Jun124

Affiliation:

1. Department of Computer Science and Electrical Engineering, Handong Global University, Pohang 37554, Republic of Korea

2. HIL Lab Inc., Pohang 37563, Republic of Korea

3. Department of Physics, Korea Advanced Institute of Science, Daejeon 34141, Republic of Korea

4. Department of Advanced Convergence, Handong Global University, Pohang 37554, Republic of Korea

Abstract

In this study, we simultaneously measured the group refractive index dispersion and thickness of fused silica using a scanning white light interferometer on a spectral range from 800 to 1050 nm. A delay error correction was performed using a He-Ne laser. The accuracy of the measured group refractive index dispersion of fused silica, when compared to the temperature-dependent Sellmeier equation, is within 4 × 10−5.

Funder

National Research Foundation of Korea

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Biochemistry,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference19 articles.

1. Group Velocity Dispersion in Fused-Silica Sample Measured Using White-Light Interferometry with the Equalization Wavelength Determination;Hlubina;Optik,2002

2. Dispersion Compensation of an Optical System for Femtosecond Pulses Using a Ray-Tracing Program;Seoyoung;Korean J. Opt. Photonics,2018

3. Chirped-Pulse Amplification of Laser Pulses with Dispersive Mirrors;Pervak;Opt. Express,2009

4. 0.85-PW, 33-Fs Ti:Sapphire Laser;Aoyama;Opt. Lett.,2003

5. ASE Suppression in a High Energy Titanium Sapphire Amplifier;Ertel;Opt. Express,2008

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