Isolated Spin-7/2 Species of Gadolinium (III) Chelate Complexes on the Surface of 5-nm Diamond Particles

Author:

Osipov Vladimir Yu.1ORCID,Boukhvalov Danil W.23ORCID,Takai Kazuyuki4

Affiliation:

1. Ioffe Institute, Polytechnicheskaya 26, St.-Petersburg 194021, Russia

2. Institute of Materials Physics and Chemistry, College of Science, Nanjing Forestry University, Nanjing 210037, China

3. Institute of Physics and Technology, Ural Federal University, Mira 19 Str., Yekaterinburg 620002, Russia

4. Department of Chemical Science and Technology, Hosei University, Tokyo 184-8584, Japan

Abstract

The magnetic characteristics of a system of triply charged gadolinium ions Gd3+ chelated with carboxyls on the surface of detonation nanodiamond (DND) particles have been studied. Gd3+ ions demonstrate almost perfect spin (S = 7/2) paramagnetism with negligible antiferromagnetic interaction between spins (Weiss temperature about −0.35 K) for a wide range of concentrations up to ~18 ions per 5 nm particle. The study of the concentration dependence of the electron paramagnetic resonance signal for DND intrinsic defects with spin ½ (g = 2.0027) shows that Gd3+ ions are located on average at a distance of no more than 1.4 nm from shallow subsurface defects with spin 1/2. At the same time, they are located (according to density functional theory calculations) at a distance of about or at least 0.28 nm from the particle surface. Magnetic studies also confirm the isolated nature of the gadolinium chelate complexes on the surface of DND particles. DND particles turn out to be an optimal carrier for high-spin 4f- ions (gadolinium) in a highly concentrated isolated state. This property makes DND-Gd particles a candidate for the role of a contrast agent for magnetic resonance imaging.

Funder

Ioffe Institute

the Ministry of Science and Higher Education of the Russian Federation

the High Performance Computing Platform of Nanjing University of Aeronautics and Astronautics

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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