Affiliation:
1. Center for Advanced Optoelectronic Functional Materials Research, Key Laboratory of UV Light-Emitting Materials, Technology of Ministry of Education, College of Physics, Northeast Normal University, Changchun 130024, China
Abstract
Metalenses, with their unique modulation of light, are in great demand for many potential applications. As a proof-of-principle demonstration, we focus on designing SiO2 metalenses that operate in the deep ultraviolet region, specifically around 193 nm. Based on the deep ultraviolet metalens proposed in this paper, an integrated deep ultraviolet doublet metalens is further offered. When the incident light is a plane wave with a wavelength of 193 nm, the integrated doublet metalens can reduce the beam size by a factor of 4:1, and the emitted light is flat. The integrated doublet metalens can project the reticle image proportionally, making the projection image clear. The integrated doublet metalens has the best imaging effect at the propagation distance of 2 μm and can tolerate ±3 degrees of incident angle deviation. Our findings establish general and systematic strategies to guide the design of traditional optical lens arrays with excellent integrated doublet metalenses and pave the way for enhanced optical performance in the application of large-relative-aperture deep ultraviolet detection, deep ultraviolet microscope systems, laser beam combining systems, deep ultraviolet lithography systems, etc.
Funder
Distinguished Young Scholars of Jilin Province
Scientific and Technological Development Project of Jilin Province
National Natural Science Foundation of China
Excellent Member of Youth Innovation Promotion Association of the Chinese Academy of Sciences
Leading Talents and Team Project of Scientific and Technological Innovation for Young and Middle-Aged Groups in Jilin Province
Subject
Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science