Modeling the Effects of Threading Dislocations on Current in AlGaN/GaN HEMT

Author:

Liu Censong1,Wang Jie1ORCID,Chen Zhanfei1ORCID,Liu Jun1,Su Jiangtao1

Affiliation:

1. Zhejiang Key Laboratory of Large-Scale Integrated Circuit Design, Hangzhou Dianzi University, Hangzhou 310018, China

Abstract

The aim of this paper is to model the effects of threading dislocations on both gate and drain currents of AlGaN/GaN high electron mobility transistors (HEMTs). The fraction of filled traps increases with the threading dislocations, while the trapping effects cause a decrease in drain current and an increase in gate leakage current. To model the drain current drop, the two simplified RC subcircuits with diodes are proposed to capture the charge trapping/detrapping characteristics. The trap voltages Vg_trap and Vd_trap generated by RC networks are fed back into the model to capture the effects of traps on drain current. Considering acceptor-decorated dislocations, we present a novel Poole–Frenkel (PF) model to precisely describe the reverse leakage gate current, which plays a dominant role in the gate leakage current. The proposed model, which uses physical parameters only, is implemented in Verilog-A. It is in excellent agreement with the experimental data.

Funder

National Natural Science Foundation of China

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering

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