Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters
Author:
Publisher
MDPI AG
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Control and Systems Engineering
Link
http://www.mdpi.com/2072-666X/7/9/151/pdf
Reference29 articles.
1. Supported Tantalum Oxide and Supported Vanadia-tantala Mixed Oxides: Structural Characterization and Surface Properties
2. Thin films and nanostructures of niobium pentoxide: fundamental properties, synthesis methods and applications
3. Optical properties and microstructure of plasma deposited Ta2O5 and Nb2O5 films
4. High Performance Electrochromic Devices Based on Anodized Nanoporous Nb2O5
5. Chemical Vapor Deposition of Tantalum Oxide from Tetraethoxo(β-diketonato)tantalum(V) Complexes
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