Author:
Kim ,Lee ,Hyun ,Je ,Park ,Bae ,Kim ,Kim
Abstract
We developed a 193-nm deep ultraviolet (DUV) microscope system based on the reflection mode for a precise inspection of various types of defects/cracks on large optical surfaces of the order of one meter in size. Without preprocessing the sample at room temperature and atmospheric pressure, which is commonly necessary for electron microscopy, the reflective 193-nm DUV microscope was used to directly observe optical surface defects in a manner similar to conventional optical microscopes. In addition, the limitations on the selection of materials and thickness of optical samples of transmittive DUV microscopes were overcome. DUV microscope imaging and the analysis on the spatial resolution were verified using a 1D grating structure with a 225-nm line width. This system could be widely applied as an inspection tool because it provides high resolution at the 200-nm scale that is close to the diffraction limit of a 193-nm DUV beam. In the near future, it is expected that our system would be extended to nano/bio imaging as well as the inspection of large optical surfaces.
Funder
National Research Council of Science and Technology
Korea Basic Science Institute
Subject
Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献