In-situ Deposition of Graphene Oxide Catalyst for Efficient Photoelectrochemical Hydrogen Evolution Reaction Using Atmospheric Plasma

Author:

Alam Khurshed,Sim Yelyn,Yu Ji-Hun,Gnanaprakasam Janani,Choi Hyeonuk,Chae Yujin,Sim Uk,Cho Hoonsung

Abstract

The vacuum deposition method requires high energy and temperature. Hydrophobic reduced graphene oxide (rGO) can be obtained by plasma-enhanced chemical vapor deposition under atmospheric pressure, which shows the hydrophobic surface property. Further, to compare the effect of hydrophobic and the hydrophilic nature of catalysts in the photoelectrochemical cell (PEC), the prepared rGO was additionally treated with plasma that attaches oxygen functional groups effectively to obtain hydrophilic graphene oxide (GO). The hydrogen evolution reaction (HER) electrocatalytic activity of the hydrophobic rGO and hydrophilic GO deposited on the p-type Si wafer was analyzed. Herein, we have proposed a facile way to directly deposit the surface property engineered GO.

Funder

National Research Foundation of Korea

Korea Institute of Energy Technology Evaluation and Planning

Korea Institute of Materials Science

Publisher

MDPI AG

Subject

General Materials Science

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