Thermal-Stress Coupling Optimization for Coaxial through Silicon Via

Author:

Chen Dongdong1ORCID,Yang Yintang1,Wang Xianglong1ORCID,Li Di1ORCID,Liang Yi1,Xu Changqing1ORCID

Affiliation:

1. School of Microelectronics, Xidian University, Xi’an 710071, China

Abstract

In this paper, a thermal-stress coupling optimization strategy for coaxial through silicon via (TSV) is developed based on the finite element method (FEM), artificial neural network (ANN) model and particle swarm optimization (PSO) algorithm. In order to analyze the effect of design parameters on the thermal-stress distribution of coaxial TSV, the FEM simulations of coaxial TSV are conducted by COMSOL Multiphysics. The structure of coaxial TSV is symmetric. The mapping relationships between the design parameters and performance indexes are described by ANN models based on the simulation data of FEM. In addition, the multi-objective optimization function is formulated based on the desired performance indexes, and then the design parameters are optimized by the modified PSO algorithm. Based on the optimized design parameters, the effectiveness of the developed method is validated by FEM simulations. The simulated performance indexes agree well with the desired ones, which implies that the design parameters of coaxial TSV can be optimized to control the thermal-stress distribution. Therefore, the thermal-stress coupling optimization of coaxial TSV can achieve thermal-stress management to improve its reliability.

Funder

Youth Talent Fund of the Joint Fund of the Ministry of Education for Equipment Pre-Research

Wuhu and Xidian University special fund for industry-university-research cooperation

Cooperation Program of XDU-Chongqing IC Innovation Research Institute

Fundamental Research Funds for the Central Universities

Innovation Fund of Xidian University

Publisher

MDPI AG

Subject

Physics and Astronomy (miscellaneous),General Mathematics,Chemistry (miscellaneous),Computer Science (miscellaneous)

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