Influence of GLAD Sputtering Configuration on the Crystal Structure, Morphology, and Gas-Sensing Properties of the WO3 Films

Abstract

In this paper, we describe a deposition method and investigation of the physical properties of WO3 films. We investigated tungsten oxide due to its potential application as a gas sensor. Thin films of the WO3 were deposited on glass, silicon, and alumina substrates by magnetron GLAD sputtering. The crystallinity of films was determined by X-ray diffraction (XRD) and the thickness by X-Ray Reflectivity (XRR) and spectroscopic ellipsometry (SE). Surface morphology, which is important for gas sensitivity, was measured by atomic force microscopy (AFM). We studied the gas-sensing characteristics under exposure to acetone in the 0.1–1.25 ppm range which covers the levels of exhaled breath acetone. We show that WO3 sensors have different sensitivity for different sputter angle. Furthermore, we demonstrate the influence of temperature during gas content measurement.