Abstract
In this paper, we focus on the research of Al addition on Hf–Al–C film structure and oxidation resistance. It was found that obtained Hf–A–C films consist of a solid solution of Al in non-stoichiometric cubic HfC and have identical XRD patterns to bcc–HfC. Besides, the Al addition decreases the sample mass gain during oxidation in air at temperatures up to 800 °C. Mass gain for Hf–Al–C was 44.3 and 22.5% less, compared to pristine HfC, at 600 and 800 °C, respectively.
Funder
Russian Federation program “Nauka”
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces
Cited by
1 articles.
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