Influence of the Arsenic Pressure during Rapid Overgrowth of InAs/GaAs Quantum Dots on Their Photoluminescence Properties

Author:

Balakirev Sergey1ORCID,Kirichenko Danil1,Chernenko Natalia1,Shandyba Nikita1,Komarov Sergey2ORCID,Dragunova Anna2,Kryzhanovskaya Natalia2ORCID,Zhukov Alexey2,Solodovnik Maxim1ORCID

Affiliation:

1. Laboratory of Epitaxial Technologies, Institute of Nanotechnologies, Electronics and Equipment Engineering, Southern Federal University, 347922 Taganrog, Russia

2. International Laboratory of Quantum Optoelectronics, HSE University, 190008 St. Petersburg, Russia

Abstract

In this paper, for the first time, we report a strong effect of the arsenic pressure used for the high-rate GaAs capping of self-assembled InAs quantum dots on their optical properties. A 140 nm red shift of the photoluminescence peak position is observed when the overgrowth arsenic pressure increases threefold. We explain this behavior in terms of different intensities of quantum dot decomposition, which occurs during the overgrowth under different conditions. When the arsenic pressure is sufficiently high, a GaAs capping layer is formed by deposited species with a low impact on initial quantum dots. At a low arsenic pressure, arsenic deficiency leads to the intensive intermixing caused both by the enhanced Ga/In atom exchange and by the consumption of arsenic atoms belonging to quantum dots for the GaAs capping layer formation. As a result of the overgrowth, quantum dots are divided into families with a large (high pressure) and a small (low pressure) average size, yielding long-wave (1.23 µm) and short-wave (1.09 µm) photoluminescence peaks, respectively. Thus, a significant influence of the overgrowth arsenic pressure on the characteristics of InAs quantum dots is evidenced in this study.

Funder

Ministry of Science and Higher Education of the Russian Federation

“Mirror Laboratories”, HSE University

Publisher

MDPI AG

Subject

Inorganic Chemistry,Condensed Matter Physics,General Materials Science,General Chemical Engineering

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