A Model-Based Approach for Measuring Wavefront Aberrations Using Random Ball Residual Compensation

Author:

Li Jianke1234,Quan Haiyang1234,Jin Chuan123,Liu Junbo1234,Zhu Xianchang1234,Wang Jian1234ORCID,Hu Song1234

Affiliation:

1. National Key Laboratory of Optical Field Manipulaion Science and Technology, Chinese Academy of Sciences, Chengdu 610209, China

2. State Key Lab of Optical Technologies on Nano-Fabrication and Micro-Engineering, Chinese Academy of Sciences, Chengdu 610209, China

3. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China

4. University of Chinese Academy of Sciences, Beijing 100049, China

Abstract

The projection objective lens holds a pivotal role in lithography, directly influencing imaging system quality and, consequently, the lithography machine’s feature dimensions. Optical inspection methods for this lens require advancements in calibrating systematic error and enhancing alignment precision of auxiliary devices, given their impact on calibration accuracy. In the random averaging method, random ball can give rise to additional wavefront aberrations due to misalignment and numerical aperture mismatch. To mitigate these aberrations and enhance the accuracy of systematic error calibration, this paper introduces a random ball residual compensation (RBRC) model. Additionally, when combined with the random averaging technique, it elevates the calibration accuracy of the measured lens’s wavefront aberrations. The experimental results underscore the method’s effectiveness, accurately determining optical component eccentricities and numerical aperture errors. After eliminating these errors, more accurate values of lens wavefront aberrations are achieved. This research significantly contributes to enhancing error calibration of lithography objective lens systems.

Funder

Youth Innovation Promotion Association of the Chinese Academy of Sciences

project of the Western Light of Chinese Academy of Science

CAS Specific Research Assistant Funding Program

Publisher

MDPI AG

Subject

Radiology, Nuclear Medicine and imaging,Instrumentation,Atomic and Molecular Physics, and Optics

Reference32 articles.

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