A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel-Reference-Cited by-同舟云学术

A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel

Published:2017-12-05 Issue:12 Volume:17 Page:2816
ISSN:1424-8220
Container-title:Sensors
language:en
Short-container-title:Sensors

Author:

Takahashi Seiji,Huang Yi-Min,Sze Jhy-Jyi,Wu Tung-Ting,Guo Fu-Sheng,Hsu Wei-Cheng,Tseng Tung-Hsiung,Liao King,Kuo Chin-Chia,Chen Tzu-Hsiang,Chiang Wei-Chieh,Chuang Chun-Hao,Chou Keng-Yu,Chung Chi-Hsien,Chou Kuo-Yu,Tseng Chien-Hsien,Wang Chuan-Joung,Yaung Dun-Nien

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Biochemistry,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Link

http://www.mdpi.com/1424-8220/17/12/2816/pdf

Reference21 articles.

1. Enhancement of low light level images using color-plus-mono dual camera

2. [Paper] A Low Noise and High Sensitivity Image Sensor with Imaging and Phase-Difference Detection AF in All Pixels

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