The Road to a Robust and Affordable SiC Power MOSFET Technology

Author:

Maddi Hema Lata Rao,Yu Susanna,Zhu Shengnan,Liu Tianshi,Shi Limeng,Kang Minseok,Xing Diang,Nayak Suvendu,White Marvin H.,Agarwal Anant K.ORCID

Abstract

This article provides a detailed study of performance and reliability issues and trade-offs in silicon carbide (SiC) power MOSFETs. The reliability issues such as threshold voltage variation across devices from the same vendor, instability of threshold voltage under positive and negative gate bias, long-term reliability of gate oxide, screening of devices with extrinsic defects by means of gate voltage, body diode degradation, and short circuit withstand time are investigated through testing of commercial devices from different vendors and two-dimensional simulations. Price roadmap and foundry models of SiC MOSFETs are discussed. Future development of mixed-mode CMOS circuits with high voltage lateral MOSFETs along with 4−6× higher power handling capability compared to silicon circuits has been described.

Funder

Ford Alliance

Publisher

MDPI AG

Subject

Energy (miscellaneous),Energy Engineering and Power Technology,Renewable Energy, Sustainability and the Environment,Electrical and Electronic Engineering,Control and Optimization,Engineering (miscellaneous)

Reference43 articles.

1. Fundamentals of Silicon Carbide Technology: Growth, Characterization, Devices, and Applications;Kimoto,2014

2. Review of Silicon Carbide Power Devices and Their Applications

3. Semiconductor Power Devices. Physics, Characteristics, Reliability;Lutz,2018

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Influence of Channel Length and Gate Oxide Thickness Variations in 3300 V 4H-SiC VDMOSFET;Solid State Phenomena;2024-08-23

2. Implementation of Silicon Carbide Four-Switch Three-Phase Inverters;2024 IEEE Transportation Electrification Conference and Expo (ITEC);2024-06-19

3. Investigation on gate oxide reliability under gate bias screening for commercial SiC planar and trench MOSFETs;Materials Science in Semiconductor Processing;2024-05

4. Evaluation of Burn-in Technique on Gate Oxide Reliability in Commercial SiC MOSFETs;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14

5. Silicon Carbide Dmosfet Design Adaptation for LOW Interface Trap Density;2024 8th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2024-03-03

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3