Tuning Interlayer Exciton Emission with TMD Alloys in van der Waals Heterobilayers of Mo0.5W0.5Se2 and Its Binary Counterparts

Author:

Aly Mohammed Adel12ORCID,Enakerakpor Emmanuel Oghenevo1,Koch Martin1ORCID,Masenda Hilary13ORCID

Affiliation:

1. Faculty of Physics and Materials Sciences Center, Philipps-Universität Marburg, 35032 Marburg, Germany

2. Department of Physics, Faculty of Science, Ain Shams University, Cairo 11566, Egypt

3. School of Physics, University of the Witwatersrand, Johannesburg 2050, South Africa

Abstract

Semiconductor heterostructures have been the backbone of developments in electronic and optoelectronic devices. One class of structures of interest is the so-called type II band alignment, in which optically excited electrons and holes relax into different material layers. The unique properties observed in two-dimensional transition metal dichalcogenides and the possibility to engineer van der Waals heterostructures make them candidates for future high-tech devices. In these structures, electronic, optical, and magnetic properties can be tuned through the interlayer coupling, thereby opening avenues for developing new functional materials. We report the possibility of explicitly tuning the emission of interlayer exciton energies in the binary–ternary heterobilayer of Mo0.5W0.5Se2 with MoSe2 and WSe2. The respective interlayer energies of 1.516 eV and 1.490 eV were observed from low-temperature photoluminescence measurements for the MoSe2– and WSe2– based heterostructures, respectively. These interlayer emission energies are above those reported for MoSe2/WSe2 (≃1.30–1.45 eV). Consequently, binary–ternary heterostructure systems offer an extended energy range and tailored emission energies not accessible with the binary counterparts. Moreover, even though Mo0.5W0.5Se2 and MoSe2 have almost similar optical gaps, their band offsets are different, resulting in charge transfer between the monolayers following the optical excitation. Thus, confirming TMDs alloys can be used to tune the band-offsets, which adds another design parameter for application-specific optoelectronic devices.

Funder

Egyptian Ministry of Higher Education and Scientific Research and Deutsche Akademische Austausch Dienst

Alexander von Humboldt (AvH) Foundation

Deutsche Forschungsgemeinschaft

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

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