Changed Detection Based on Patch Robust Principal Component Analysis

Author:

Zhu WenqiORCID,Zhang ZiliORCID,Zhao XingORCID,Fu YinghuaORCID

Abstract

Change detection on retinal fundus image pairs mainly seeks to compare the important differences between a pair of images obtained at two different time points such as in anatomical structures or lesions. Illumination variation usually challenges the change detection methods in many cases. Robust principal component analysis (RPCA) takes intensity normalization and linear interpolation to greatly reduce the illumination variation between the continuous frames and then decomposes the image matrix to obtain the robust background model. The matrix-RPCA can obtain clear change regions, but when there are local bright spots on the image, the background model is vulnerable to illumination, and the change detection results are inaccurate. In this paper, a patch-based RPCA (P-RPCA) is proposed to detect the change of fundus image pairs, where a pair of fundus images is normalized and linearly interpolated to expand a low-rank image sequence; then, images are divided into many patches to obtain an image-patch matrix, and finally, the change regions are obtained by the low-rank decomposition. The proposed method is validated on a set of large lesion image pairs in clinical data. The area under curve (AUC) and mean average precision (mAP) of the method proposed in this paper are 0.9832 and 0.8641, respectively. For a group of small lesion image pairs with obvious local illumination changes in clinical data, the AUC and mAP obtained by the P-RPCA method are 0.9893 and 0.9401, respectively. The results show that the P-RPCA method is more robust to local illumination changes than the RPCA method, and has stronger performance in change detection than the RPCA method.

Funder

Open Project Foundation of Intelligent Information Processing Key Laboratory of Shanxi Province

Publisher

MDPI AG

Subject

Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science

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