Affiliation:
1. School of Electronics and Communication Engineering, Guangzhou University, Guangzhou 510006, China
2. Key Lab of Si-Based Information Materials & Devices and Integrated Circuits Design, Guangzhou University, Guangzhou 510006, China
Abstract
A picowatt CMOS voltage reference with dual outputs is proposed and simulated in this paper based on a standard 65 nm process. To compensate for the leakage current caused by parasitic reverse-biased PN junctions, an approach employing gate leakage transistors is proposed. Maintaining a maximal temperature coefficient (TC) of 20.40 ppm/°C across an extended temperature range of −10∼155 °C is achieved. Additionally, a voltage divider consisting of diode-connected NMOS transistors is introduced to obtain a lower voltage output without shunting the original branch or utilizing operational amplifiers. Moreover, a novel trimming block is utilized to optimize TC across different process corners. Simulation results demonstrate that a minimum power consumption of only 53.83 pW is achieved and the line sensitivity is 0.077%/V with 0.45 V to 2.5 V supply. The power supply rejection ratio of −76.70 dB at 10 Hz and VDD = 1.8 V is obtained.
Funder
National College Students Innovation and Entrepreneurship Training Program
Special Fund Project for Science and Technology Innovation Strategy of Guangdong Province
Natural Science Foundation of Guangdong Province, China
Science and Technology Project of Guangzhou
Special Projects in Key Fields of Guangdong Education Department
Reference34 articles.
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