Effects of Rapid Thermal Annealing on the Structural, Electrical, and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition
Author:
Publisher
MDPI AG
Subject
General Materials Science
Link
http://www.mdpi.com/1996-1944/9/8/695/pdf
Reference31 articles.
1. Band gap widening and narrowing in moderately and heavily doped n-ZnO films
2. Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films
3. Atomic Layer Deposition of Al-doped ZnO Films: Effect of Grain Orientation on Conductivity
4. Structural and Electrical Properties of Atomic Layer Deposited Al-Doped ZnO Films
5. Atomic layer deposition and characterization of Ga-doped ZnO thin films
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