Treatment of Polishing Wastewater from Semiconductor Manufacturer by Dispersed Air Flotation-Reference-Cited by-同舟云学术

Treatment of Polishing Wastewater from Semiconductor Manufacturer by Dispersed Air Flotation

Published:2006-01 Issue:1 Volume:132 Page:51-57
ISSN:0733-9372
Container-title:Journal of Environmental Engineering
language:en
Short-container-title:J. Environ. Eng.

Author:

Lien C. Y.¹²,Liu J. C.¹²

Affiliation:

1. Graduate Student, Dept. of Chemical Engineering, National Taiwan Univ. of Science and Technology, 43 Keelung Rd., Sec. 4, Taipei 106, Taiwan

2. Professor, Dept. of Chemical Engineering, National Taiwan Univ. of Science and Technology, 43 Keelung Rd., Sec. 4, Taipei, 106 Taiwan (corresponding author).

Publisher

American Society of Civil Engineers (ASCE)

Subject

General Environmental Science,Civil and Structural Engineering,Environmental Chemistry,Environmental Engineering

Link

http://ascelibrary.org/doi/pdf/10.1061/%28ASCE%290733-9372%282006%29132%3A1%2851%29

Reference24 articles.

1. Confirmation of the Heterocoagulation Theory of Flotation

2. Treating wastewater from CMP using ultrafiltration;Browne S.;Micro,1999

3. Modification of quartz surfaces using cationic surfactant solutions

4. Targeting water use for chemical mechanical polishing;Corlett G.;Solid State Technol.,2000

5. Evaluating and treating CMP wastewater;Golden J. H.;Semicond. Int.,2000

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