Influence of metal electrodes onc-axis orientation of AlN thin films deposited by DC magnetron sputtering-Reference-Cited by-同舟云学术

Influence of metal electrodes onc-axis orientation of AlN thin films deposited by DC magnetron sputtering

Published:2017-04-20 Issue:9 Volume:49 Page:885-891
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Imran Shahid¹^ORCID,Yuan Jun²,Yin Ge²,Ma Yungui²,He Sailing¹²³

Affiliation:

1. ZJU-SCNU Joint Research Centre of Photonics, Centre for Optical and Electromagnetic Research, South China Academy of Advanced Optoelectronics; South China Normal University; 510006 Guangzhou China

2. State Key Lab of Modern Optical Instrumentation, Centre for Optical and Electromagnetic Research, College of Optical Science and Engineering; Zhejiang University; 310058 Hangzhou China

3. Department of Electromagnetic Engineering, School of Electrical Engineering; Royal Institute of Technology; S-100 44 Stockholm Sweden

Funder

National Natural Science Foundation of China

Guangdong Innovative Research Team Program

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference44 articles.

1. Reactive DC magnetron sputtering of aluminum nitride films for surface acoustic wave devices

2. AlN-based surface acoustic wave resonators for temperature sensing applications

3. Effect of AlN Film Thickness and Top Electrode Materials on Characteristics of Thin-Film Bulk Acoustic-Wave Resonator Devices