Well-defined diblock and triblock copolymers for KrF lithography
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/app.32610/fullpdf
Reference17 articles.
1. Present and future of 193nm lithography
2. Photoresists for microlithography
3. Thermal Flow Property for 193nm Photoresist with Low Dispersion Polymer
4. Copolymers with Well-Controlled Molecular Weight and Low Polydispersity for 193 nm Photoresists
5. Tailored polymers by free radical processes
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