Hollow Cylindrical Magnetron-Reference-Cited by-同舟云学术

Hollow Cylindrical Magnetron

Published:2017-03-03 Issue: Volume: Page:123-136
ISSN:
Container-title:Gas-Phase Synthesis of Nanoparticles
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Author:

Oiko Vitor Toshiyuki Abrao¹,de Sá Artur Domingues Tavares¹,Rodrigues Varlei¹

Affiliation:

1. Universidade Estadual de Campinas; Instituto de Física “Gleb Wataghin”, Departamento de Física Aplicada, Rua Sérgio Buarque de Holanda; 777, Cidade Universitária Zeferino Vaz, Barão Geraldo Campinas São Paulo 13083-859 Brazil

Publisher

Wiley-VCH Verlag GmbH & Co. KGaA

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/9783527698417.ch7/fullpdf

Reference44 articles.

1. The effect of a uniform magnetic field on the motion of electrons between coaxial cylinders;Hull;Phys. Rev.,1921

2. Optimization of plasma parameters for high rate deposition of titanium nitride films as protective coating on bell-metal by reactive sputtering in cylindrical magnetron device;Borah;Appl. Surf. Sci.,2008

3. Cylindrical magnetron sputtering system for coating solar selective surfaces onto batches of tubes;Harding;J. Vac. Sci. Technol.,1979

4. Magnetron sputtering: basic physics and application to cylindrical magnetrons;Thornton;J. Vac. Sci. Technol.,1978

5. Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering;Thornton;J. Vac. Sci. Technol.,1977

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