Solid-phase epitaxy. Effects of irradiation, dopant, and pressure
Author:
Publisher
Wiley
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference84 articles.
1. Chaneling effect measurements of the recrystallization of amorphous Si layers on crystal Si
2. Substrate‐orientation dependence of the epitaxial regrowth rate from Si‐implanted amorphous Si
3. Regrowth kinetics of amorphous Ge layers created by 74Ge and 28Si implantation of Ge crystals
4. Low‐temperature epitaxial regrowth of ion‐implanted amorphous GaAs
5. Direct measurement of solid‐phase epitaxial growth kinetics in GaAs by time‐resolved reflectivity
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Defective Solid-Phase Epitaxial Growth of Si;Semiconductors and Semimetals;2015
2. Solid-Phase Epitaxy;Handbook of Crystal Growth;2015
3. Experimental setup for investigating silicon solid phase crystallization at high temperatures;Optics Express;2013-07-01
4. Stressed multidirectional solid-phase epitaxial growth of Si;Journal of Applied Physics;2009-04-15
5. Stressed solid-phase epitaxial growth of (011) Si;Journal of Materials Research;2009-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3