Ion-Beam-Induced CVD: An Alternative Method of Thin Film Preparation-Reference-Cited by-同舟云学术

Ion-Beam-Induced CVD: An Alternative Method of Thin Film Preparation

Published:1997-08 Issue:4 Volume:3 Page:219-226
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Espinós Juan P.,Fernádez Asunción,Caballero Alfonso,Jiménez Victor M.,Sánchez-López Juan C.,Contreras Leopoldo,Leinen Dietmar,González-Elipe Agustin R.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference26 articles.

1. Thin Films by Chemical Vapour Deposition, Elsevier, Amsterdam 1990.

2. Photo‐enhanced chemical vapor deposition: System design considerations

3. Growth of cubic (100) SrTiO3 thin films by plasma-enhanced chemical vapor deposition using a novel titanium precursor

4. Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. I. Preparation and characterization of TiO2 thin films

5. Focused ion beam induced deposition of low-resistivity gold films

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