Photoelectric Properties of Functional Materials under High Pressure

Author:

Li Zonglun1,Liu Ran1,Li Quanjun1ORCID,Liu Bingbing1

Affiliation:

1. State Key Laboratory of Superhard Materials Jilin University Changchun 130012 China

Abstract

AbstractThe past decade has seen enormous interest in emerging photodetectors owing to their diverse applications in daily life and military fields. Tremendous progress has been made in the exploration and optimization of photoelectric materials. In particular, high pressure has been successfully adopted as a significant means to tune photoelectric properties. The remarkable enhancement in photocurrent by several orders of magnitude, induces inverse photoconductivity, and even extends the spectral response range, which was achieved by using the pressure strategy in several functional materials. In this prospective article, recent advances in pressure‐regulated photoelectric properties of various functional materials are briefly elaborated on. In addition, the current challenges and possible research directions are discussed. It is sincerely hoped to inspire more new endeavors to promote further investigation of the photoelectric properties of functional materials under high pressure and provide more insights into exploring and optimizing novel photoelectric materials.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

Wiley

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