Use of Supramolecular Assemblies as Lithographic Resists-Reference-Cited by-同舟云学术

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Use of Supramolecular Assemblies as Lithographic Resists

Published:2017-05-15 Issue:24 Volume:56 Page:6749-6752
ISSN:1433-7851
Container-title:Angewandte Chemie International Edition
language:en
Short-container-title:Angew. Chem. Int. Ed.

Author:

Lewis Scott M.¹,Fernandez Antonio¹,DeRose Guy A.²,Hunt Matthew S.²,Whitehead George F. S.¹,Lagzda Agnese¹,Alty Hayden R.¹,Ferrando-Soria Jesus¹,Varey Sarah¹,Kostopoulos Andreas K.¹,Schedin Fredrik³,Muryn Christopher A.¹,Timco Grigore A.¹,Scherer Axel²,Yeates Stephen G.¹^ORCID,Winpenny Richard E. P.¹^ORCID

Affiliation:

1. The School of Chemistry; The University of Manchester; Oxford Road Manchester M13 9PL UK

2. The Kavli Nanoscience Institute; California Institute of Technology; 1200 East California Boulevard, 107-81 Pasadena CA 91125 USA

3. The National Graphene Institute; The University of Manchester; Oxford Road Manchester M13 9PL UK

Funder

Engineering and Physical Sciences Research Council

Kavli Nanoscience Institute

Publisher

Wiley

Subject

General Chemistry,Catalysis

Reference30 articles.

1. www.nobelprize.org 2016

2. A 160-kilobit molecular electronic memory patterned at 1011 bits per square centimetre

3. Sequence-Specific Peptide Synthesis by an Artificial Small-Molecule Machine

4. Dynamic control of chirality and self-assembly of double-stranded helicates with light

5. Supramolecular spin valves

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