48‐1: Solid‐State Laser Crystallization for Poly‐Si TFTs and Their Applications
Author:
Affiliation:
1. Tianma Japan, Ltd. Kawasaki Japan
Publisher
Wiley
Subject
General Medicine
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.15561
Reference14 articles.
1. XeCl Excimer laser annealing used in the fabrication of poly-Si TFT's
2. High-performance TFTs fabricated by XeCl excimer laser annealing of hydrogenated amorphous-silicon film
3. Crystallization of amorphous silicon films by Nd:YAG laser heating
4. HelenY et al. “Reproducible high field effect mobility polysilicon thin film transistors involving pulsed Nd:YVO4laser crystallization ”International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) pp.297–300 (1999) doi:10.1109/IEDM.1999.824155.
5. Double-Crystalline Silicon Channel Thin Film Transistors Fabricated Using Continuous-Wave Green Laser for Large Organic Light-Emitting Diode Displays
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