Electrolytic Growth and Dissolution of Oxide Layers on Silicon in Aqueous Solutions of Fluorides
Author:
Publisher
Wiley
Subject
General Chemical Engineering
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/bbpc.198800138/fullpdf
Reference11 articles.
1. Nature cristallo-physico-chimique de l'interface entre un semiconducteur et son oxyde propre. I. — Etudes expérimentales des semiconducteurs des groupes A4 et A3 B5
2. Effects of Anodic Polarization Upon Electrochemically Grown Oxide Films on p-Si, Studied by Ellipsometric and Capacitance Measurements
3. On the Mechanism of Chemically Etching Germanium and Silicon
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