Depth resolution in sputter profiling revisited-Reference-Cited by-同舟云学术

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Depth resolution in sputter profiling revisited

Published:2016-06-08 Issue:13 Volume:48 Page:1354-1369
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Hofmann S.¹,Liu Y.²,Jian W.²,Kang H.L.²,Wang J.Y.²

Affiliation:

1. Max Planck Institute for Intelligent Systems (formerly MPI for Metals Research); Heisenbergstrasse 3 D-70569 Stuttgart Germany

2. Department of Physics; Shantou University; 243 Daxue Road Shantou 515063 Guangdong China

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference50 articles.

1. Deconvolution method for composition profiling by Auger sputtering technique

2. Surface and thin film analysis of semiconductor materials

3. Evaluation of concentration-depth profiles by sputtering in SIMS and AES

4. General aspects of trace analytical methods-IV. Recommendations for nomenclature, standard procedures and reporting of experimental data for surface analysis techniques;Morrison;Pure Appl. Chem.,1979

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