Suppression of Hot‐Carrier Effects Facilitated by the Multimodal Thin‐Film Transistor Architecture
Author:
Affiliation:
1. Advanced Technology Institute University of Surrey Guildford GU2 7XH UK
2. IETR‐DMM‐UMR6164 University of Rennes Rennes 35000 France
Funder
Engineering and Physical Sciences Research Council
Publisher
Wiley
Subject
Electronic, Optical and Magnetic Materials
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/aelm.202100533
Reference63 articles.
1. Introduction to Thin Film Transistors
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4. Device Instability Under High Gate and Drain Biases in InGaZnO Thin Film Transistors
5. Influence of Oxygen Flow Rate on Channel Width Dependent Electrical Properties of Indium Gallium Zinc Oxide Thin-Film Transistors
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