Solution‐Processed High‐Performance ZnO Nano‐FETs Fabricated with Direct‐Write Electron‐Beam‐Lithography‐Based Top‐Down Route

Author:

Tiwale Nikhil1ORCID,Senanayak Satyaprasad P.2ORCID,Rubio‐Lara Juan1ORCID,Prasad Abhinav3,Aziz Atif1,Alaverdyan Yury4,Welland Mark E.1

Affiliation:

1. Nanoscience Centre Department of Engineering University of Cambridge Cambridge CB30FF UK

2. School of Physical Sciences National Institute of Science Education and Research HBNI Jatni 752050 India

3. Institute for Gravitational Research School of Physics and Astronomy University of Glasgow Glasgow G128QQ UK

4. Cambridge Graphene Centre, Department of Engineering University of Cambridge Cambridge CB30FA UK

Funder

Cambridge Commonwealth, European and International Trust

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

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