Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO-Reference-Cited by-同舟云学术

Nondestructive Direct Photolithography for Patterning Quantum Dot Films by Atomic Layer Deposition of ZnO

Author:

Lee Joon Yup¹,Kim Eun A¹,Han Jisu²,Choi Yeong‐Ho²,Hahm Donghyo³,Kang Chi Jung⁴,Bae Wan Ki³,Lim Jaehoon²,Cho Seong‐Yong¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering Myongji University Yongin 17058 Republic of Korea

2. Department of Energy Science and Center for Artificial Atoms Sungkyunkwan University (SKKU) Suwon 16419 Republic of Korea

3. SKKU Advanced Institute of Nanotechnology (SAINT) School of Nano Science & Technology Sungkyunkwan University (SKKU) Suwon 16419 Republic of Korea

4. Department of Physics Myongji University Yongin 17058 Republic of Korea

Funder

National Research Foundation of Korea

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

Reference36 articles.

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