Boron Phosphide Films by Reactive Sputtering: Searching for a P‐Type Transparent Conductor-Reference-Cited by-同舟云学术

Boron Phosphide Films by Reactive Sputtering: Searching for a P‐Type Transparent Conductor

Published:2022-02-27 Issue:12 Volume:9 Page:2200031
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv Materials Inter

Author:

Crovetto Andrea¹²^ORCID,Adamczyk Jesse M.³^ORCID,Schnepf Rekha R.¹³^ORCID,Perkins Craig L.¹^ORCID,Hempel Hannes²^ORCID,Bauers Sage R.¹^ORCID,Toberer Eric S.³^ORCID,Tamboli Adele C.¹³^ORCID,Unold Thomas²^ORCID,Zakutayev Andriy¹^ORCID

Affiliation:

1. Materials Science Center National Renewable Energy Laboratory Golden CO 80401 USA

2. Department of Structure and Dynamics of Energy Materials Helmholtz‐Zentrum Berlin für Materialien und Energie GmbH 14109 Berlin Germany

3. Department of Physics Colorado School of Mines Golden CO 80401 USA

Funder

National Science Foundation

H2020 Marie Skłodowska-Curie Actions

U.S. Department of Energy

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202200031

Reference71 articles.

1. Thermal Properties and Phonon Spectral Characterization of Synthetic Boron Phosphide for High Thermal Conductivity Applications

2. Semiconducting Properties of Cubic Boron Phosphide

3. Epitaxial growth of BP compounds on Si substrates using the B2H6-PH3-H2 system

4. BP‐Stabilized n‐Si and n ‐ GaAs Photoanodes

5. Refractory semiconductor of boron phosphide

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