Electrostatic Boundary Conditions and (Electro)chemical Interface Stability

Author:

Huang Binxiang1ORCID,Erhart Paul2ORCID,Yang Tongqing3,Klein Andreas1ORCID

Affiliation:

1. Institute of Materials Science Technical University of Darmstadt Otto‐Berndt‐Str. 3 64287 Darmstadt Germany

2. Department of Physics Chalmers University of Technology SE‐41296 Gothenburg Sweden

3. Functional Materials Research Laboratory Tongji University Cao'an Road 4800 Shanghai 201804 China

Abstract

AbstractInterface stability is a key factor for stable operation of electronic and electrochemical devices. This contribution introduces an approach for the operando analysis of interfaces using photoelectron spectroscopy employing a solid oxide electrochemical cell. The combined chemical and electronic information provided by the experiment reveals that not only chemical but also electrostatic boundary conditions are essential for interface stability. The approach is demonstrated using (anti‐)ferroelectric (Pb,La)(Zr,Sn,Ti)O3 dielectrics.

Funder

Hessisches Ministerium für Wissenschaft und Kunst

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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