15‐4: New Gen. 6 Exposure Tools for 1.2 μm Resolution-Reference-Cited by-同舟云学术

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15‐4: New Gen. 6 Exposure Tools for 1.2 μm Resolution

Published:2020-08 Issue:1 Volume:51 Page:204-207
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:SID Symposium Digest of Technical Papers

Author:

Yabu Nobuhiko¹,Hakko Manabu¹,Takasaki Koichi¹,Okubo Toru¹,Oyanagi Takeo¹,Ando Miwako¹,Terashi Takaaki¹,Izumi Nozomu¹,Nagano Kouhei¹,Osaki Yoshinori¹

Affiliation:

1. Canon Inc. Tochigi Japan

Publisher

Wiley

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.13838

Reference5 articles.

1. Complete analysis of a two-mirror unit magnification system Part 1

2. Catadioptric projection optical system for flat panel exposure tool;Kohno M;Proc. SPIE,2006

3. High-resolution technology for FPD manufacturing

4. Development of G6 exposure tool for 1.2 μm resolution;Nagano K;J Soc Inf Display,2019

5. To Specialize an Attenuated Phase Shift Mask in DUV Broadband Illumination;Hakko M;FMCp1‐5, Proc. IDW ’17,2017

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1. Abnormal threshold voltage shifts in p-channel low temperature polycrystalline silicon TFTs under deep UV irradiation;AIP Advances;2021-08-01

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