8.1: Invited Paper: Advanced Process and Structure for High Performance Oxide Thin‐Film Transistors
Author:
Affiliation:
1. Dept. of Electronic Engineering Hanyang University Seoul 133-791 Korea
Funder
Korea Evaluation Institute of Industrial Technology
Publisher
Wiley
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.13391
Reference13 articles.
1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
2. Present status of amorphous In–Ga–Zn–O thin-film transistors
3. Ionic amorphous oxide semiconductors: Material design, carrier transport, and device application
4. Role of order and disorder in covalent semiconductors and ionic oxides used to produce thin film transistors
5. Hexagonal a-Si:H TFTs: A New Advanced Technology for Flat-Panel Displays
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