1. Airborne molecular contamination detection method for photomasks and ultra purging decontamination;Kambara;Proc SPIE,2009
2. ArF lithography reticle crystal growth contributing factors;Eschbach;Proc SPIE,1999
3. A practical solution to the critical problem of 193 nm reticle haze;Kishkovich;Proc SPIE,2007
4. Reticle surface contaminants and their relationship to sub-pellicle defect formation;Grenon;Proc SPIE,2004
5. Longevity of 193-nm/ArF excimer pellicle;Kozeki;Proc SPIE,2001