A virtual metrology system based on least angle regression and statistical clustering-Reference-Cited by-同舟云学术

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A virtual metrology system based on least angle regression and statistical clustering

Published:2012-09-17 Issue:4 Volume:29 Page:362-376
ISSN:1524-1904
Container-title:Applied Stochastic Models in Business and Industry
language:en
Short-container-title:Appl. Stochastic Models Bus. Ind.

Author:

Susto Gian Antonio¹,Beghi Alessandro¹

Affiliation:

1. Department of Information Engineering; University of Padova; Via Gradenigo 6/B 35131 Padova Italy

Publisher

Wiley

Subject

Management Science and Operations Research,General Business, Management and Accounting,Modeling and Simulation

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/asmb.1948/fullpdf

Reference45 articles.

1. An approach for factory-wide control utilizing virtual metrology;Khan;IEEE Transactions on Semiconductor Manufacturing,2007

2. A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing;Hung;IEEE/ASME Transactions on Mechatronics,2007

3. Estimation and control in semiconductor etch: practice and possibilities;Ringwood;IEEE Transactions on Semiconductor Manufacturing,2010

4. Run by run process control: combining SPC and feedback control;Sachs;IEEE Transactions on Semiconductor Manufacturing,1995

5. Susto GA Beghi A DeLuca C A predictive maintenance system for silicon epitaxial deposition IEEE Conference on Automation Science and Engineering (CASE) 2011 262 267

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