Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing-Reference-Cited by-同舟云学术

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Decision-based virtual metrology for advanced process control to empower smart production and an empirical study for semiconductor manufacturing

Published:2022-07 Issue: Volume:169 Page:108245
ISSN:0360-8352
Container-title:Computers & Industrial Engineering
language:en
Short-container-title:Computers & Industrial Engineering

Author:

Chien Chen-Fu,Hung Wei-Tse,Pan Chin-Wei,Van Nguyen Tran Hong

Funder

Micron Foundation

Ministry of Science and Technology, Taiwan

Publisher

Elsevier BV

Subject

General Engineering,General Computer Science

Reference57 articles.

1. An empirical study of demand forecasting of non-volatile memory for smart production of semiconductor manufacturing;Chen;International Journal of Production Research,2018

2. Feature extraction for defect classification and yield enhancement in color filter and micro-lens manufacturing and an empirical study;Chen;Journal of Industrial and Production Engineering,2013

3. An empirical study of design-of-experiment data mining for yield-loss diagnosis for semiconductor manufacturing;Chien;Journal of Intelligent Manufacturing,2014

4. Data-driven framework for tool health monitoring and maintenance strategy for smart manufacturing;Chien;IEEE Transactions on Semiconductor Manufacturing,2020

5. Adaptive parametric yield enhancement via collinear multivariate analytics for semiconductor intelligent manufacturing;Chien;Applied Soft Computing,2021

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