Growth and Modification of Organosilicon Films in PECVD and Remote Afterglow Reactors-Reference-Cited by-同舟云学术

Growth and Modification of Organosilicon Films in PECVD and Remote Afterglow Reactors

Published:2006-02-17 Issue:2 Volume:3 Page:100-109
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Supiot Philippe,Vivien Céline,Granier Agnès,Bousquet Angélique,Mackova Anna,Escaich David,Clergereaux Richard,Raynaud Patrice,Stryhal Zdenek,Pavlik Jaroslav

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference21 articles.

1. Diagnostics in helicon plasmas for deposition

2. Infrared absorption analysis of organosilicon/oxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance

3. The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD

4. Mechanisms of plasma polymerization of various silico-organic monomers

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