Continuous and Modulated Deposition of Fluorocarbon Films from c-C4F8 Plasmas-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Continuous and Modulated Deposition of Fluorocarbon Films from c-C4F8 Plasmas

Published:2004-09-24 Issue:2 Volume:1 Page:164-170
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Milella Antonella,Palumbo Fabio,Favia Pietro,Cicala Grazia,d'Agostino Riccardo

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Cited by 70 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Foundations of plasma enhanced chemical vapor deposition of functional coatings;Plasma Sources Science and Technology;2023-07-01

2. Zeta potential variations in bonding states of fluorocarbon films deposited by plasma-enhanced chemical vapor deposition;Japanese Journal of Applied Physics;2023-05-09

3. Dissociative electron attachment to c-C4F8 molecules and clusters;The European Physical Journal D;2023-04

4. Femtosecond laser surface roughening and pulsed plasma polymerization duplex treatment on medical-grade stainless steel substrates for orthodontic purpose;Surface and Coatings Technology;2021-12

5. Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF 4 /H 2 plasma at different substrate temperatures;Plasma Processes and Polymers;2021-08-04

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP