Microcrystalline silicon-carbon alloys as anti-reflection window layers in high efficiency thin film silicon solar cells
Author:
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Reference16 articles.
1. Highly conductive p-type microcrystalline SiC:H prepared by ECR plasma CVD
2. Low Temperature (320°C) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films
3. Low Substrate Temperature Deposition of Crystalline SiC using HWCVD
4. Low substrate temperature deposition of crystalline SiC using HWCVD
5. Structural properties of microcrystalline SiC deposited at low substrate temperatures by HWCVD
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2. Dual hot-wire arrangement for the deposition of silicon and silicon carbide thin films;Thin Solid Films;2015-01
3. Microstructure of hydrogenated silicon carbide thin films prepared by chemical vapour deposition techniques;Journal of Non-Crystalline Solids;2012-09
4. Microcrystalline silicon carbide window layers in thin film silicon solar cells;Solar Energy Materials and Solar Cells;2012-03
5. Development of microcrystalline silicon carbide window layers by hot-wire CVD and their applications in microcrystalline silicon thin film solar cells;Thin Solid Films;2011-05
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