Nanomanufacturing for Electronics or Optoelectronics-Reference-Cited by-同舟云学术

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Nanomanufacturing for Electronics or Optoelectronics

Published:2016-09-19 Issue: Volume: Page:103-109
ISSN:
Container-title:Future Trends in Microelectronics
language:
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Author:

Kelly M. J.¹²

Affiliation:

1. Department of Engineering, Centre for Advanced Photonics and Electronics; University of Cambridge; 9 JJ Thomson Avenue CB3 0FA Cambridge United Kingdom

2. MacDiarmid Institute for Advanced Materials and Nanotechnology; Victoria University of Wellington; Wellington 6140 New Zealand

Publisher

John Wiley & Sons, Inc.

Reference12 articles.

1. Intrinsic top-down unmanufacturability;Kelly;Nanotechnology,2011

2. A specific nanomanufacturing challenge;Kelly;Nanotechnology,2016

3. Extremely uniform tunnel barriers for low-cost device manufacture;Missous;IEEE Electron Device Lett.,2015

4. Achieving reproducibility needed for manufacturing semiconductor tunnel devices;Shao;Electronics Lett.,2013

5. Tunnel devices are not yet manufacturable;Wilkinson;Semicond. Sci. Technol.,1997

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