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Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species

  • Published:2003 Issue:1 Volume:43 Page:93-114
  • ISSN:0271-2091
  • Container-title:International Journal for Numerical Methods in Fluids
  • language:en
  • Short-container-title:Int. J. Numer. Meth. Fluids

Author:

Wu J.-S.,Hsiao W.-J.,Lian Y.-Y.,Tseng K.-C.

Publisher

Wiley

Subject

Applied Mathematics,Computer Science Applications,Mechanical Engineering,Mechanics of Materials,Computational Mechanics

Reference24 articles.

1. Chemical Vapour Deposition: An Overview in Chemical Vapour Deposition: Principles and Applications. (eds). Academic Press: New York, 1993.

2. Simulation and analysis of rarefied gas flows in chemical vapour deposition processes. Ph.D. Thesis, MIT, 1993.

3. A Mathematical Model of the Hydrodynamics and Gas‐Phase Reactions in Silicon LPCVD in a Single‐Wafer Reactor

4. A Mathematical Model of the Gas-Phase and Surface Chemistry in GaAs Mocvd

5. A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor

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