P‐130: 3207‐ppi, 1.50‐in. OLED Microdisplay with All Pixels Formed Through RGB Side‐by‐Side Patterning by Photolithography-Reference-Cited by-同舟云学术

P‐130: 3207‐ppi, 1.50‐in. OLED Microdisplay with All Pixels Formed Through RGB Side‐by‐Side Patterning by Photolithography

Published:2023-06 Issue:1 Volume:54 Page:1334-1337
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:Symp Digest of Tech Papers

Author:

Yamane Yasumasa¹,Sugisawa Nozomu¹,Nakamura Daiki¹,Isa Toshiyuki¹,Sato Hitomi¹,Shimada Daigo¹,Mizuguchi Toshiki¹,Tamatsukuri Yuki¹,Ito Minato¹,Sugaya Kentaro¹,Fujie Takahiro¹,Yanagisawa Yuichi¹,Hiura Yoshikazu¹,Hodo Ryota¹,Sasagawa Shinya¹,Kunitake Hitoshi¹,Yamazaki Shunpei¹

Affiliation:

1. Semiconductor Energy Laboratory Co., Ltd. Kanagawa Japan

Abstract

Our method for side‐by‐side OLED layer patterning by photolithographic etching offers devices with properties almost equivalent to those of devices consistently fabricated in vacuum. We fabricate herein a 3207‐ppi 1.50‐in low‐power OLED microdisplay with an ultrahigh aperture ratio and no lateral leakage using this method.

Publisher

Wiley

Subject

General Medicine

Reference17 articles.

1. Scaling Down of OLED Pixels Enabled by Photolithography;Ke Tung-Huei;SID 2022 DIGEST,2022

2. Development of Active-Matrix NanoLED Display Using Heavy-Metal- Free QDs Patterned by Photolithography Process;Nakanishi Yohei;SID 2022 DIGEST,2022

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